Here is the abstract you requested from the CICMT_2007 technical program page. This is the original abstract submitted by the author. Any changes to the technical content of the final manuscript published by IMAPS or the presentation that is given during the event is done by the author, not IMAPS.
|Study on Producing High Precision Micro Ceramic Device with High Aspect Ratio by Liga Process|
|Keywords: micro ceramic device, liga, Embossing|
|A method of producing high precision micro ceramic device with high aspect ratio was present. The micro structures moulding were fabricated by using synchrotron lithography, UV lithography or injection moulding. Under vacuum and high pressure circumstances. Then ceramic microstructures were formed through embossing process. After the lost mold process, the formed ceramic microstructures were sintered at 1700oC in furnace. The micro ceramic structure with width of 30 um and height of 400 um could be fabricated through this method. The micro fabrication process can also be applied to ceramic micro-reactor making.|
|Jun Wang, Student
National Synchrotron Radiation Laboratory (NSRL)
Hefei, Anhui 230029 ,