Micross

Abstract Preview

Here is the abstract you requested from the Passives_2007 technical program page. This is the original abstract submitted by the author. Any changes to the technical content of the final manuscript published by IMAPS or the presentation that is given during the event is done by the author, not IMAPS.

Embedded Discrete High K Capacitor Characterization in LTCC
Keywords: Embedded Capacitor, LTCC, High K Thick Film
This paper will discuss in detail the measurement results of the embedded discrete high K capacitors when fabricated within a Low Temperature Co-fired Ceramic (LTCC) structure. It will cover design rules and typical measured capacitor values and ranges which use high K thick film formulations of K ~500 and K ~1800 with X7R characteristics when embedded within the LTCC circuits. These capacitors could be utilized as biased and decoupling capacitors; near and around MMICs and ICs instead of using surface mount capacitors or integrating them in the IC technology. Details of the properties of the dielectric materials, circuit functional designs and functional properties of the circuits will be discussed, along with processing details and recommendations.
Tim Mobley, Applications Development Engineer
DuPont Electronic Technologies
RTP, NC
USA


CORPORATE PREMIER MEMBERS
  • Amkor
  • ASE
  • Canon
  • EMD Performance Materials
  • Honeywell
  • Indium
  • Kester
  • Kyocera America
  • Master Bond
  • Micro Systems Technologies
  • MRSI
  • NGK NTK
  • Palomar
  • Plexus
  • Promex
  • Qualcomm
  • Quik-Pak
  • Raytheon
  • Specialty Coating Systems