Here is the abstract you requested from the Thermal_2007 technical program page. This is the original abstract submitted by the author. Any changes to the technical content of the final manuscript published by IMAPS or the presentation that is given during the event is done by the author, not IMAPS.
|Si/SiGe Quantum Well Thermoelectric Materials and Devices for Waste Heat Recovery From Vehicles and Industrial Plants|
|Keywords: thermoelectric, quantum well materials, nanotechnology|
|Fabrication development of high efficiency quantum well (QW) thermoelectric materials continues with the P-type and N-type Si/Si80Ge20 films with encouraging results. These films are fabricated on Kapton and Si substrates and are being developed for low (<300 degrees C) or as well as high temperature operation where they offer efficiencies several times more than available today. Sputtering is used to deposit the 10 nanometer (100 Angstroms) thick alternating layers of Si and Si0.80Ge0.20. Both isothermal and gradient life testing are underway. One couple has achieved over 4000 hours at a TH of 300 degrees C and TC of 50 degrees C. Emphasis is now shifting towards couple and module design and fabrication, especially for low resistance joining techniques between the N and P legs. These modules are being developed for us in thermoelectric conversion systems for recovering waste heat from cars, trucks and industrial processes, as well as for cooling applications.|
|Saeid Ghamaty, Ph.D, Staff Physicist
Hi-Z Technology, Inc.
San Diego, CA