Here is the abstract you requested from the CICMT_2009 technical program page. This is the original abstract submitted by the author. Any changes to the technical content of the final manuscript published by IMAPS or the presentation that is given during the event is done by the author, not IMAPS.
|Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) for Barrier Coatings on Polymers|
|Keywords: Atomic Layer Deposition, Molecular Layer Deposition, Barrier|
|Flexible, ultrathin gas diffusion barriers are required on polymers. One of the key application areas is organic electronics, especially organic light emitting diodes (OLED) for flexible displays. Existing barriers provide insufficient protection from permeating H2O and O2 gases. Flexibility requirements are particularly challenging and will require the use of hybrid organic/inorganic multilayers to obtain sufficient barrier performance without cracking under strain. Our earlier work has shown that Al2O3 atomic layer deposition (ALD) films can obtain water vapor transmission rate (WVTR) values of <1 x 10-4 g/m2/day. Even lower WVTR values of < 1 x 10-6 g/m2/day are required for flexible OLEDs. These low WVTR values should be achieved by fabricating multilayers of Al2O3 ALD films with flexible polymeric interlayers. We have recently demonstrated the molecular layer deposition (MLD) of alucone films. Alucone is an organic/inorganic polymer formed by reacting an aluminum organometallic precursors (e.g. trimethylaluminum) with a diol (e.g. ethylene glycol). The resulting alucone MLD polymer is very flexible and can serve as a flexible interlayer. This talk will discuss the fabrication of Al2O3 ALD/alucone MLD multilayers and some new MLD polymeric materials that may yield enhanced barrier properties.|
|Dragos Seghete, Research Assistant
University of Colorado