Micross

Abstract Preview

Here is the abstract you requested from the CICMT_2009 technical program page. This is the original abstract submitted by the author. Any changes to the technical content of the final manuscript published by IMAPS or the presentation that is given during the event is done by the author, not IMAPS.

Defects Affecting Dielectric Properties of BaTiO3 Films in Applying Aerosol Deposition Method to Thin Film Process
Keywords: aerosol deposition method, barium titanate, thin film
For high frequencies and miniaturization of mobile communication devices, embedded planar decoupling capacitors have been required to be developed for reducing electrical noises and packing area. To overcome problems in high-temperature process of conventional coating techniques, we were paid attention to aerosol deposition method and fabricated BaTiO3 thin films on Cu substrates at room temperature for obtaining embedded planar decoupling capacitors with high capacitance density. However, although XRD peaks of crystallized BaTiO3 thin films existed, the permittivity of BaTiO3 films was hardly measured due to very large leakage currents when their thickness became thinner than of approximately 1 micron. In this study, the defects causing the high leakage currents were investigated in order to achieve BaTiO3 thin films with high capacitance density for embedded planar decoupling capacitors employing aerosol deposition method.
Song-Min Nam, Associate Professor
Kwangwoon University
Seoul 139-701,
South Korea


CORPORATE PREMIER MEMBERS
  • Amkor
  • ASE
  • Canon
  • EMD Performance Materials
  • Honeywell
  • Indium
  • Kester
  • Kyocera America
  • Master Bond
  • Micro Systems Technologies
  • MRSI
  • NGK NTK
  • Palomar
  • Plexus
  • Promex
  • Qualcomm
  • Quik-Pak
  • Raytheon
  • Specialty Coating Systems