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|Fabrication and Characteristics Dielectric Film by using Plasma Assisted Aerosol Deposition Method|
|Keywords: Aerosol deposition, Dielectric property, Plasma assistance|
|The dielectric films such as PZT and BT were formed by using the plasma assisted aerosol deposition method. We investigated that influence of plasma assistance for a deposition rate, microstructure, and the dielectric properties of the films. The deposition rate of PZT film increased while applying RF power to an ICP coil was increased. The deposition rate was approximately 1ƒÊm/min. when using AD method without plasma assistance, whereas the film thickness was around about 26ƒÊm/min. when using the ICP with the RF power of 800 W. Without plasma assistance, dielectric constant and loss of PZT film are about 50 and 1.6%, respectively. With plasma assistance, dielectric constant rise to about 240 while RF power is 800W. Additionally, hysteresis property improves by using plasma assistance too.|
|Masakazu Mori, Assistant Professor
Otsu, Siga 520-2194,