Here is the abstract you requested from the IMAPS_2010 technical program page. This is the original abstract submitted by the author. Any changes to the technical content of the final manuscript published by IMAPS or the presentation that is given during the event is done by the author, not IMAPS.
|Evaluation of Glass Frits for Development of Lead-Free Thick Film Resistor|
|Keywords: Lead-free, Resistor, Thick film|
|This work develped a RuO2 based thick film resistor compatible with standard thick film firing. Thirty three commercially available glasses were evaluated for fired microstructure,wetting and CTE match. DSC/ TGA and SEM/EDS analysis was perfromed to determine composition and reaction endo/exotherms. Two glasses were selected and a RuO2 resistor system developed. X-ray diffraction on sapphire substrate (to minimize any interference from diffraction peaks of the alumina substrate) were perfromed to evaluate the glass-RuO2 interactions. A lead-free ruthenium oxide based resistor system was developed that could be fired with a standard thick film firing profile, formulations that covered a range from 400 ohms/sq. to 0.4 Mohms/sq with a TCR in the +- 350 ppm/deg. C .|
|W. Kinzy Jones, Sr., Professor
Florida International University