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New Perovskite Nanomaterials and their Integration Technologies for High-K Dielectrics
Keywords: Perovskite nanosheet, solution-based assembly, high-k nanodielectrics
We report a new approach to produce robust high-k nanodielectrics using perovskite nanosheet (Sr2-xCaxNb3O10), a new class of nanomaterials that are derived from layered compounds by exfoliation. By solution-based bottom-up approach using perovskite nanosheets, we have successfully fabricated multilayer nanofilms directly on various substrates without any interfacial dead layers. These nanofilms exhibit high dielectric constant (200~240), the largest value seen so far in perovskite films with the thickness down to 10 nm. Furthermore, the superior high-k properties are a size-effect-free characteristic with low leakage current density (< 10-7 A cm-2). Our work represents a step towards bottom-up paradigm for future high-k devices.
Minoru Osada, Senior Researcher
National Institute for Materials Science
Tsukuba, Ibaraki 305-0044,
Japan


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