Here is the abstract you requested from the MMC_2011 technical program page. This is the original abstract submitted by the author. Any changes to the technical content of the final manuscript published by IMAPS or the presentation that is given during the event is done by the author, not IMAPS.
|Preliminary Analysis of Overlay Registration Components for Roll-to-Roll Technology in Photolithography|
|Keywords: roll to roll, photolithography, processing|
|The microlithographic process, also known as high-resolution photolithography, is defined as a “process of constructing interconnect microstructures to create large-area integrated circuits” [Azores®, 2007]. The photolithography process replicates microstructure patterns from reticles (masks) that are exposed onto a substrate that is resist coated. Some of these microstructures are: resistors, transistors, and connecting lines (transmissions lines). However, the crucial part of developing these structures is patterning the functional material. In this particular case, the material (substrate) utilized is metalized polyethylene therephthalete (PET) that is resist coated, to be patterned in Roll-to-Roll format (unsupported films). The purpose of this research is to demonstrate the preliminary overlay data from the photolithography equipment in R2R format. Essentially, overlay will require the use of the alignment marks, called Reflective Alignment System (RAS), that are exposed during the first layer (first pass of exposures). Subsequently, the objective is to use these RAS marks to align the second layer (second pass of exposures) to the first layer. One of the fundamental challenges for this part of the project is “finding” the alignment marks in order to expose the second layer in the proper location. At the same time – other challenges may arise that pertain to other processes along the way in order to develop a second layer. More specifically for this phase of the research – overlay is understood as simply a second pass and not as laying an image on top of another. Hence, the overall idea is to use a checkers type pattern (e.g.; chess board) of one of the masks found at the CAMM where one layer contains alignment marks with a set of squares (e.g.; white squares of chess board) and the second layer contain the second set of squares (e.g.; black squares of chess board). The final image should show how accurate the alignment system interlocks all the images in the locations that were programmed creating the final image with all the squares at the desired location.|
|Denisse Yepez, Student
Binghamton , NY