Here is the abstract you requested from the Thermal_2011 technical program page. This is the original abstract submitted by the author. Any changes to the technical content of the final manuscript published by IMAPS or the presentation that is given during the event is done by the author, not IMAPS.
|Calibration and Temperature Sensitivity in Thermoreflectance and Infrared Imaging|
|Keywords: Thermal imaging, Calibration, Temperature accuracy|
|Infrared (IR) emission and thermoreflectance are two widely used techniques to obtain full field thermal images of electronic and optoelectronic devices. Thermal images provide useful information for understanding the thermal behavior of real devices and/or systems. Despite this merit of use, questions are frequently asked about image quality, accuracy, calibration process, and the difference between two methods. In this talk, we highlight these key technological aspects of these two imaging methods. Because of the inherent difference in the physical principle to extract temperature information, each technique has unique characteristics which can be used in different applications. The resolution of these imaging technologies is defined by the optical diffraction limit of the wave length. The temperature information of the thermal image is based on the material properties, e.g. emissivity for the IR imaging and reflectance coefficient for thermoreflectance imaging, respectively. The difference of the principles also requires the each specific process for the calibrations.|
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