Here is the abstract you requested from the Printed_2012 technical program page. This is the original abstract submitted by the author. Any changes to the technical content of the final manuscript published by IMAPS or the presentation that is given during the event is done by the author, not IMAPS.
|All-Fiber Electronics by Nanoscale Integration of Inorganics in Textiles|
|Keywords: Nanoscale, 3D Electronic Devices, Textile|
|Complex fiber systems based on paper, woven or nonwoven textiles are unique integration platforms for 3D electronic devices which take advantage of the construction, high surface area and flexibility of the textile. Integration schemes for the inorganic materials required for these devices are introduced by the use of atomic layer deposition (ALD) methods. Atomic layer deposition (ALD) is examined as a means for producing conformal coatings on polymer fibrous substrates with nanoscale precision at compatible temperatures. The growth of multi-layered structures of ALD Al2O3, ZnO, Al-doped ZnO, and W on natural and synthetic fiber systems such as woven cotton, nonwoven polypropylene, nonwoven nylon-6, and cellulose paper show the means of producing ‘all-fiber’ devices. ALD is also shown as a bridging technology to make a hydrophobic and hydrophilic polymer surface more compatible for subsequent surface processes. For example, the effect of ALD coatings on polytetrafluoroethylene (PTFE), results in a 50 dynes/cm increase in surface energy to produce a hydrophilic surface that is more readily available for aqueous nanoparticle ink-based printing. Future opportunities on the design and patterning capability optical and electronics devices using a textile substrate will be presented.|
|Jesse S. Jur , Assistant Professor
North Carolina State University; Department of Textile, Chemistry & Engineering