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Feasibility of Micro-Plasma Transistor Device in LTCC
Keywords: micro-plasma, LTCC, transistor
This project will determine the feasibility of making a novel micro-plasma transistor device (MPT device) in LTCC and characterize the performance. LTCC is beneficial for the MPT due to its resistance to plasma erosion and ease in implementing circuits using multiple layers of LTCC. The MPT device uses a double looped RF antenna to create plasma that is controlled by electrodes imbedded in the LTCC using integrated 3D electronic circuits. The MPT device is fabricated using DuPont 951 LTCC tapes and the ceramic MEMS fabrication process. Current tests show results of successful creation of plasma and operation of the source/drain electrodes with varying hole and slit dimensions. In addition, operational parameters such as electrode configuration and source/drain voltage and current will be presented. The MPT device is being tested at BSU using a vacuum chamber and associated electronic hardware. After the tests are administered, the feasibility of micro-plasma transistors in LTCC will be determined.
Brooke Garner,
Boise State Univeristy
Boise, ID

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